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1 sputtering deposition
English-Russian dictionary on nuclear energy > sputtering deposition
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2 sputtering deposition
English-Russian electronics dictionary > sputtering deposition
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3 sputtering deposition
The New English-Russian Dictionary of Radio-electronics > sputtering deposition
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4 sputtering deposition
1) Техника: осаждение методом распыления2) Микроэлектроника: осаждение напылением -
5 sputtering deposition
English-Russian dictionary of electronics > sputtering deposition
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6 cathodic sputtering deposition
English-Russian electronics dictionary > cathodic sputtering deposition
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7 reactive sputtering deposition
English-Russian electronics dictionary > reactive sputtering deposition
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8 cathodic sputtering deposition
The New English-Russian Dictionary of Radio-electronics > cathodic sputtering deposition
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9 reactive sputtering deposition
The New English-Russian Dictionary of Radio-electronics > reactive sputtering deposition
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10 cathodic sputtering deposition
Электроника: осаждение методом катодного распыленияУниверсальный англо-русский словарь > cathodic sputtering deposition
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11 reactive sputtering deposition
Электроника: осаждение методом реактивного распыленияУниверсальный англо-русский словарь > reactive sputtering deposition
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12 cathodic sputtering deposition
English-Russian dictionary of electronics > cathodic sputtering deposition
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13 reactive sputtering deposition
English-Russian dictionary of electronics > reactive sputtering deposition
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14 deposition
1) осаждение•- axial vapor deposition
- cathodic sputter deposition
- cathodic sputtering deposition
- chemical deposition - directional deposition
- electrochemical deposition
- electroless deposition
- electrolytic deposition
- electron-beam deposition
- epitaxial deposition
- evaporative deposition
- film deposition
- gas deposition
- heteroepitaxial deposition
- homoepitaxial deposition
- inside vapor deposition
- ion deposition - masked deposition
- metal-organic chemical vapor deposition
- molecular-beam deposition
- multistep deposition
- normal incidence deposition
- outside vapor deposition
- planar epitaxial deposition
- plasma deposition
- pulse-laser deposition
- pyrolytic deposition
- reactive sputter deposition
- reactive sputtering deposition
- selective deposition
- serigraphic deposition
- sputter deposition
- sputtering deposition
- vacuum vapor deposition -
15 deposition
1) осаждение•- axial vapor deposition
- cathodic sputter deposition
- cathodic sputtering deposition
- chemical deposition
- chemical vapor deposition
- contact metal deposition
- directional deposition
- electrochemical deposition
- electroless deposition
- electrolytic deposition
- electron-beam deposition
- epitaxial deposition
- evaporative deposition
- film deposition
- gas deposition
- heteroepitaxial deposition
- homoepitaxial deposition
- inside vapor deposition
- ion deposition
- liquid-source chemical vapor deposition
- mask deposition
- masked deposition
- metal-organic chemical vapor deposition
- molecular-beam deposition
- multistep deposition
- normal incidence deposition
- outside vapor deposition
- planar epitaxial deposition
- plasma deposition
- pulse-laser deposition
- pyrolytic deposition
- reactive sputter deposition
- reactive sputtering deposition
- selective deposition
- serigraphic deposition
- sputter deposition
- sputtering deposition
- vacuum vapor depositionThe New English-Russian Dictionary of Radio-electronics > deposition
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16 deposition
1) отложение; осаждение2) напыление, термовакуумное испарение•deposition on the mold — загрязнение пресс-формы-
aerosol deposition
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alternate deposition
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atmospheric deposition
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carbon deposition
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chemical deposition of metals
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chemical deposition
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chemical vapor deposition
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dry deposition
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electric arc deposition
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electrochemical deposition
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electroless deposition
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electrolytic deposition
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electron-beam deposition
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epitaxial deposition
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evaporation deposition
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film deposition
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flame deposition
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frost deposition
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gas deposition
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glaze-ice and rime deposition
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hot-wall chemical vapor deposition
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ion-beam induced deposition
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ion-beam deposition
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ion-beam sputter deposition
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metal deposition
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metallization deposition
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metal-organic chemical vapor deposition
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metal-organic deposition
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molecular-beam deposition
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multistep deposition
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photochemical vapor deposition
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physical vapor deposition
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plasma-enchanced deposition
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plasma deposition
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polycrystalline deposition
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selective deposition
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serigraphic deposition
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snow deposition
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spray/fusion deposition
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sputtering deposition
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sputter deposition
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thin film deposition
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turbulent deposition
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vacuum deposition
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vapor-phase deposition
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vapor deposition
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welding deposition
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weld deposition
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wet deposition -
17 sputter deposition
= sputtering deposition осаждение методом распыления -
18 sputter deposition
= sputtering deposition осаждение методом распыленияThe New English-Russian Dictionary of Radio-electronics > sputter deposition
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19 ion sputtering
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20 ion-beam sputtering
English-Russian big polytechnic dictionary > ion-beam sputtering
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См. также в других словарях:
Sputtering — is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic ions. It is commonly used for thin film deposition, etching and analytical techniques (see below). Physics of sputtering Physical… … Wikipedia
Sputtering — Pulvérisation cathodique La pulvérisation cathodique est une méthode de dépôt de couche mince. Sommaire 1 Principe 1.1 Synthèse de films céramiques 1.2 Instabilité électrique … Wikipédia en Français
Sputtering — A process used to apply photovoltaic semi conductor material to a substrate by a physical vapor deposition process where high energy ions are used to bombard elemental sources of semiconductor material, which eject vapors of atoms that are then … Energy terms
Pulsed laser deposition — (PLD) is a thin film deposition (specifically a physical vapor deposition, PVD) technique where a high power pulsed laser beam is focused inside a vacuum chamber to strike a target of the desired composition. Material is then vaporized from the… … Wikipedia
Sputter deposition — is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a target, that is source, which then deposits onto a substrate, such as a silicon wafer. Resputtering is re emission of the… … Wikipedia
Thin-film deposition — is any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. Thin is a relative term, but most deposition techniques allow layer thickness to be controlled within a few tens of nanometers, and some … Wikipedia
High Power Impulse Magnetron Sputtering — (HIPIMS, also known as High Impact Power Magnetron Sputtering and High Power Pulsed Magnetron Sputtering, HPPMS) is a method for physical vapor deposition of thin films which is based on magnetron sputter deposition. HIPIMS utilises extremely… … Wikipedia
Pulvérisation cathodique (sputtering) — Pulvérisation cathodique La pulvérisation cathodique est une méthode de dépôt de couche mince. Sommaire 1 Principe 1.1 Synthèse de films céramiques 1.2 Instabilité électrique … Wikipédia en Français
Plasma-enhanced chemical vapor deposition — PECVD machine at LAAS technological facility in Toulouse, France. Plasma enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved… … Wikipedia
Evaporation (deposition) — Evaporation machine used for metallization at LAAS technological facility in Toulouse, France. Evaporation is a common method of thin film deposition. The source material is evaporated in a vacuum. The vacuum allows vapor particles to travel… … Wikipedia
Vacuum deposition — Not to be confused with Vacuum coating. Vacuum deposition is a family of processes used to deposit layers atom by atom or molecule by molecule at sub atmospheric pressure (vacuum) on a solid surface. The layers may be as thin as one atom to… … Wikipedia